No abstract

No abstract

No abstract

Titanium dioxide (TiO2) is known as a material with exceptionally good optical, mechanical and thermal properties. An increasing interest has been devoted to the study of TiO2 because of their numerous applications in various industries. In this study, by controlling process parameters, TiO2 thin films were successfully deposited on a glass substrate using chemical vapor deposition (CVD) technique. It has been fabricated using two source materials that are 99.9 % pure titanium and graphite powder at 1000 °C annealing temperature. The deposition time were observed at 1 hour, 2 hours and 3 hours. The TiO2 thin films properties were characterized using X-Ray Diffraction (XRD), Atomic Force Microscope (AFM), Ultraviolet-Visible Spectroscopy (UV-Vis), Surface Profilometer (SP) and Current-Voltage (I-V) Measurement Tools. Based on XRD results, the intensity of mixed anatase, rutile, cotunnite type and TiO2 was highest for 3 hours deposition time. AFM images reveal the crystalline morphology with average grain size of 151.662 nm. The band gap energy obtained from UV-Vis as well as thicknesses gained from SP and resistivity acquired from Current-Voltage (I-V) Measurement of deposited TiO2 thin films were increasing with deposition time. It is vice versa for the conductivity of deposited TiO2 thin films that is declining with increasing of deposition time. It can be concluded from the experimental results that the deposition time affects the TiO2 thin films properties.

Effect of precursor's concentration on structure and morphology of ZnO nanorods synthesized through hydrothermal method on gold surface Abstract.The effect of Zinc Oxide (ZnO) thin film on the growth of ZnO nanorods (NRs) was investigated. The structures of ZnO NRs were synthesized by chemical bath deposition (CBD) method in aqueous solution of N2O6Zn.6H2O and C6H12N4 at 90°C of deposition temperature. One of the ZnO NRs samples was deposited on a ZnO seed layer coated on a glass substrate to investigate the properties of ZnO NRs without receiving effect of other materials. Next, for diode application, the ZnO NRs was deposited on tin monosulfide (SnS) coated on indium-tin-oxide (ITO) coated glass substrate (SnS/ITO). The next, the ZnO structural properties were studied from surface morphology, X-ray diffractometer (XRD) spectra, and chemical composition by using field emission scanning electron microscope (FESEM), XRD and energy dispersive X-ray Spectroscopy (EDX). The growth of ZnO NRs on ZnO seed layer was investigated by ZnO seed layer condition while the growth of ZnO NRs on SnS/ITO was investigated by deposition time and deposition temperature parameters. From FESEM images, aligned ZnO NRs were obtained, and the diameters of ZnO NRs were 0.024-3.94 μm. The SnS thin film was affected by the diameter of ZnO NRs which are the ZnO NRs grow on SnS thin films has a larger diameter compared to ZnO NRs grow on ZnO seed layer. Besides that, all of ZnO peaks observed from XRD corresponding to the wurzite structure and preferentially oriented along the c-axis. In addition, EDX shows a high composition of zinc (Zn) and oxygen (O) signals, which indicated that the NRs are indeed made up of Zn and O.