High electron mobility was achieved in Al1−xInxN∕AlN∕GaN (x=0.20–0.12) heterostructure field effect transistors (HFETs) grown by metal-organic chemical vapor deposition. Reduction of In composition from 20% to 12% increased the room temperature equivalent two-dimensional-electron-gas density from 0.90×1013to1.64×1013cm−2 with corresponding electron mobilities of 1600 and 1410cm2∕Vs, respectively. The 10K mobility reached 17600cm2∕Vs for the nearly lattice-matched Al0.82In0.18N∕AlN∕GaN heterostructure with a sheet carrier density of 9.6×1012cm−2. For comparison, the AlInN∕GaN heterostructure without the AlN spacer exhibited a high sheet carrier density (2.42×1013cm−2) with low mobility (120cm2∕Vs) at room temperature. The high mobility in our samples is in part attributed to ∼1nm AlN spacer which significantly reduces the alloy scattering as well as provides a smooth interface. The HFETs having gate dimensions of 1.5×40μm2 and a 5μm source-drain separation exhibited a maximum transconductance of ∼200mS∕mm with good pinch-off characteristics and over 10GHz current gain cutoff frequency.

A microwave noise technique has been used for experimental investigation, at room temperature, of power dissipation in the voltage-biased two-dimensional electron gas channel located in the GaN layer of a lattice-matched Al 0.82 In 0.18 N/AlN/GaN heterostructure. No saturation of the relaxation time is found in the investigated electron temperature range up to ∼2800 K: the hot-electron energy relaxation time decreases from ∼6 ps at near equilibrium to 75 ± 20 fs at ∼200 nW/electron. The electron drift velocity reaches ∼1.8 × 10 7 cm s −1 at 65 kV cm −1 electric field. The hot-phonon effect on power dissipation is discussed.

No abstract

Decay of nonequilibrium longitudinal optical ͑LO͒ phonons is investigated at room temperature in two-dimensional electron gas channels confined in nearly lattice-matched InAlN/AlN/GaN structures. A nonmonotonous dependence of the LO-phonon lifetime on the supplied electric power is reported for the first time and explained in terms of plasmon-LO-phonon resonance tuned by applied bias at a fixed sheet density ͑8 ϫ 10 12 cm −2 ͒. The shortest lifetime of 30Ϯ 15 fs is found at the power of 20Ϯ 10 nW/ electron.

Hot-electron transport was probed by nanosecond-pulsed measurements for a nominally undoped two-dimensional channel confined in a nearly lattice-matched Al 0.82 In 0.18 N / AlN/ GaN structure at room temperature. The electric field was applied parallel to the interface, the pulsed technique enabled minimization of Joule heating. No current saturation was reached at fields up to 180 kV/cm. The effect of the channel length on the current is considered. The electron drift velocity is deduced under the assumption of uniform electric field and field-independent electron density. The highest estimated drift velocity reaches ϳ3.2ϫ 10 7 cm/ s when the AlN spacer thickness is 1 nm. At high fields, a weak ͑if any͒ dependence of the drift velocity on the spacer thickness is found in the range from 1 to 2 nm. The measured drift velocity is low for heterostructures with thinner spacers ͑0.3 nm͒.