In support of the Extreme Ultraviolet Lithography (EUVL) roadmap, a SEMATECH †/CNSE ‡ joint program is under way to develop 13.5 nm R&D photolithography tools with small fields (micro-field exposure tools [METs]) and numerical apertures (NAs) of 0.5. The transmitted wavefront error of the two-mirror optical projection module (projection optics box [POB]) is specified to less than 1 nm root mean square (RMS) over its 30 µm × 200 µm image field. Not accounting for scatter and flare losses, its Strehl ratio computes to 82%. Previously reported lithography modeling on this system [1] predicted a resolution of 11 nm with a k-factor of 0.41 and a resolution of 8 nm with extreme dipole illumination. The POB's magnification (5X), track length, and mechanical interfaces match the currently installed 0.3 NA POBs [2] [3] [6], so that significant changes to the current tool platforms and other adjacent modules will not be necessary. The distance between the reticle stage and the secondary mirror had to be significantly increased to make space available for the upgraded 0.5 NA illumination modules [1].This manuscript discusses the on-going efforts to develop and fabricate this optical projection module.

No abstract

This document was prepared as an account of work sponsored by the United States Government. While this document is believed to contain correct information, neither the United States Government nor any agency thereof, nor The Regents of the University of California, nor any of their employees, makes any warranty, express or implied, or assumes any legal responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by its trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply its endorsement, recommendation, or favoring by the United States Government or any agency thereof, or The Regents of the University of California. The views and opinions of authors expressed herein do not necessarily state or reflect those of the United States Government or any agency thereof or The Regents of the University of California.

We studied temporal parental visitation of Scarlet Macaws (Ara macao) to six active nests in the Central Pacific Conservation Region of Costa Rica. Total parental time in the nest decreased significantly as the nestlings aged. Results provide guidelines to scientists for planning invasive activities to nestlings, such as placement of radio collars, or biological sample collection. These activities should be performed close to the end of the nesting period for minimal disturbance of parents and nestlings. Our results also provide information to aid wildlife guards in protecting active nests from poachers when chicks are close to fledging.