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Applying RTLS to healthcare is coming. We can now successfully install and run these systems in healthcare settings and extract useful information from them. Interactions with the clinical delivery system are at least as important as interactions with clinicians for providing access to care: measure FT, WT and FLT with RTLS; link clinical behavior, e.g. FT, with patient characteristics; explore how individual characteristics interact with system behavior.

A joint Motorola/IBM experiment was performed in mix-and-match lithography across widely separated locations. A simple pattern placement metrology data set was created, and x-ray masks were manufactured according to this data at the IBM Advanced Mask Facility in Burlington, VT. The same data was converted into a 5x reticle and optically stepped on wafers at the Motorola Advanced Product R&D Lab in Austin, TX. The x-ray mask was designed to print upon two optical fields with one x-ray exposure. The x-ray mask was aligned to the wafers at the IBM Advanced Lithography Facility in East Fishkill, NY, to produce box-in-box images for overlay metrology.The main overlay problems encountered were systematic offsets between xray and optical images, and average magnification error of -8 ppm. The magnification error is substantial because of the 3°C temperature difference between the optical stepper stage and the x-ray mask-writer. In an actual device run, the magnification differences will be removed by compensation in the e-beam writing of the x-ray mask. Offsets will be removed by use of a send-ahead wafer to determine the correct offset alignment in the x-ray stepper. It should then be possible to obtain excellent overlay on both of the paired optical fields, since the optical tool is blind-stepping a very reliable grid.

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