We investigated the effect of Fe contamination on the electronic properties of dislocation clusters in relation to oxygen precipitation in multicrystalline silicon (mc-Si). Photoluminescence (PL) spectroscopy and mapping were performed at room and liquid-He temperatures on mc-Si wafers before and after Fe contamination. PL spectra consisted of the band-edge emission, the 0.78-eV emission associated with oxygen precipitates, and the dislocation-related D-lines. The Fe contamination increased the electrically active dislocation clusters. Part of these clusters acted as preferential oxygen precipitation sites, and their electronic properties were not further influenced by the Fe contamination.