Alan Turing developed the imitation game – the Turing Test – in which an interrogator is tasked with discriminating and identifying two subjects by asking a series of questions. Based on subject feedback, the challenge to the interrogator is to correctly identify those subjects. Applying this concept to the discrimination of reality from virtual reality is essential as simulation technology progresses toward a virtual era, in which we experience equal and greater presence in virtuality than reality. It is important to explore the conceptual and theoretical underpinnings of the Turing Test in order to avoid possible issues when adapting the test for virtual reality. This requires an understanding of how users judge virtual and real environments, and how these environments influence their judgement. Turing-type tests, the constructs of reality judgement and presence, and measurement methods for each are explored. Following this brief review, the researchers contribute a theoretical foundation for future development of a Turing-type test for virtual reality, based on the universal experience of the mundane.
Plasma etching is the process by which material is removed from the surface of a sample, called substrate, through the use of plasma or reactive gases. The process of plasma etching prohibitally relies on high-cost materials and machines. This cost is potentially expanded as students attempting to learn the process run the risk of damaging the substrates or the machines, and any mistakes they make could result in great time and monetary loss. One potential solution to this conundrum is found in virtual reality (VR). VR allows schools to teach students in a safe, hazard free environment where students can make mistakes without losing much time or costing the university any money. This paper details the VR simulation Utah Valley University (UVU) is creating in order to allow students to simulate the etching process. The further goals of this paper are to explain the rationale behind the creation of the simulation and its potential in the student learning of nanotechnology.
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