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Photostructurable glass-ceramics are a promising class of materials for MEMS devices. Previous work micromachining these materials used conventional photolithography equipment and masking techniques; however, we use direct-write CAM tools and a pulsed UV laser micromachining station for rapid prototyping and enhanced depth control. We have already used this class of materials to build components for MEMS thrusters, including fuel tanks and nozzles: structures that would prove difficult to build by standard microfabrication techniques.A series of experiments was performed to characterize process parameters and establish the processing trade-offs in the laser exposure step. The hypothesis that there exists a critical dose of UV light for the growth of an etchable crystalline phase was tested by exposing the material to a fluence gradient for a variety of pulse train lengths, and then processing as usual. By measuring the dimensions of the etched region, we were able to determine the dose. We found that the dose is proportional to the square of the per-pulse fluence. This has allowed us to create not only embedded structures, but also stacked embedded structures. This also implies that we can embed tubes and tunnels with a single exposure inside a monolithic glass sample. We feel that this technique has promise for a number of applications, including microfluidics.

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A new proton lithography mechanism has been identified and investigated: the micropatterning of photosensitive etchable glass based on the crystallization of the glass after irradiation with MeV protons and heat treatment. The use of MeV protons results in a significantly reduced minimum feature size compared with reported results using ultraviolet (UV) irradiation and the threshold dose for etching is very low (4000 protons µm−2), offering the potential for creating complex microstructures by direct writing using very short exposures. The depth of the structures is determined only by the range of the protons in the glass, which allows structures with different depths to be fabricated. This technique appears to be very valuable for the rapid fabrication of high aspect ratio microstructures such as fluid networks and micro-optical devices in a material with useful optical and mechanical properties.

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