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A new sputter deposition process has been developed based upon remote generation of plasma by a dedicated Plasma Source (PLS). This technique is referred to as high target utilisation sputtering (HiTUS). In contrast to ion beam and magnetron sputtering processes, HiTUS allows fast deposition rates of low stress, high density films from a high percentage (>90%) of the target surface. The process has not previously been applied to thin films for high laser damage threshold applications. The paper will present results of the anti-reflection (AR) coating trials and compare them to two other coating deposition processes -standard e-beam evaporation and hollow cathode ion-assisted e-beam deposition.

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