Nickel sulphide (NiS) thin films were synthesized on glass and stainless steel (SS) substrates using a simple chemical bath deposition route. The structural, surface morphology were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM) respectively. The electrochemical capacitor performances were examined by using cyclic voltammetry, galvanostatic charge-discharge test and electrochemical impedance spectroscopy. In cyclic voltammetry (CV) studies, the NiS electrode exhibits the specific capacitance of 441 Fg-1 has been obtained in 2 M KOH solution at a scan rate 10 mVs-1 within the potential range 0 to 0.8 V vs. Ag/AgCl. In charge-discharge behaviors, the supercapacitive parameters such as specific energy (S.E.) and specific power (S.P.) are 10.1 Whkg −1 and 4.5 KWkg −1 respectively. Impedance spectroscopic analysis revealed that the ESR is 11 Ω in KOH electrolyte.
High volume testing of complex System on Chip (SoC) designs at reasonable test cost requires high test data and test time compression. We present a multilevel scan compression architecture that combines a flexible test compression core with an efficient dynamic broadcast structure and a high speed data access technique. Full X-tolerance, power-aware scan shift and diagnosis are supported through the entire architecture. We present a flow for assembling the various components that limits the impact on area and timing by minimizing test signals and improving modularity of the inserted design-for-test (DFT) structures. These techniques provided a reduction of 600x in test data volume and over 2300x in test time on large Graphics Processor Units (GPU) designs.
All Nickel Sulphide thin films were deposited onto the stainless steel substrate by modified chemical bath deposition method. The structural, surface morphology were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) respectively. The electrochemical capacitor performances were examined by using cyclic voltammetry and galvanostatic charge-discharge method. The NiS electrode exhibits a good cycling performance. The specific capacitance of 353 Fgm -1 has been obtained in 2 M KOH solution at a scan rate 50 mVs -1 within the potential range 0 to 0.8 V Vs Ag/AgCl. In charge-discharge behaviors, the maximum energy density (E) of 11.7 Whkg -1 and power density (P) of 4.3 kWkg -1 was obtained at a current density 1 mA/cm 2 . Impedance spectroscopic analysis revealed that the ESR is 5 Ω in KOH electrolyte.
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