The optical properties of lattice-matched GaAsSb/InGaAs/InP heterostructures with a varying InGaAs layer thickness (0–900 Å) were investigated. These structures display strong low temperature type II luminescence, the energy of which varies with the InGaAs layer thickness and ranges from 0.453 to 0.63 eV. The type II luminescence was used to determine directly and accurately the conduction band offset of these structures. The values obtained herein are 0.36 and 0.18 eV at 4.2 K for the GaAsSb/InGaAs and GaAsSb/InP heterojunctions, respectively, with the GaAsSb conduction band higher in energy.

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We report the growth and characterization of high-quality InP/GaAs0.5Sb0.5/InP heterostructures and their application to double-heterojunction bipolar transistors (DHBT). The GaAs0.5Sb0.5 layer quality was evaluated by high-resolution x-ray diffraction (XRD), low-temperature photoluminescence (PL), and atomic force microscopy (AFM). The observed 4.2 K PL linewidth was 7.7 meV and XRD rocking curves matched those of dynamical scattering simulations. In contrast to previously reported InP/GaAs0.5Sb0.5/InP DHBTs, the present devices show nearly ideal base and collector currents, low turn-on and collector offset voltages, and a high current gain. Self-aligned DHBTs exhibit a cutoff frequency over 75 GHz and common-emitter current gain greater than 100 at 300 K.

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