Two-dimensional/two-dimensional (2D/2D) heterojunctions form one of the most versatile technological solutions for building tunneling field effect transistors because of the sharp and potentially clean interfaces resulting from van der Waals assembly. Several evidences of room temperature band-to-band tunneling (BTBT) have been recently reported, but only few tunneling devices have been proven to break the Boltzmann limit of the minimum subthreshold slope, 60 mV per decade at 300 K. Here, we report the fabrication and characterization of a vertical p-type Tunnel FET (TFET) co-integrated on the same flake with a p-type MOSFET in a WSe2/SnSe2 material system platform. Due to the selected beneficial band alignment and to a van der Waals device architecture having an excellent heterostructure 2D–2D interface, the reported tunneling devices have a sub-thermionic point swing, reaching a value of 35 mV per decade, while maintaining excellent ON/OFF current ratio in excess of 105 at VDS = 500 mV. The TFET characteristics are directly compared with the ones of a WSe2 MOSFET realized on the very same flake used in the heterojunction. The tunneling device clearly outperforms the 2D MOSFET in the subthreshold region, crossing its characteristic over several orders of magnitude of the output current and providing better digital and analog figures of merit.

Junctions between n-type semiconductors of different electron affinity show rectification if the junction is abrupt enough. With the advent of 2D materials, we are able to realize thin van der Waals (vdW) heterostructures based on a large diversity of materials. In parallel, strongly correlated functional oxides have emerged, having the ability to show reversible insulator-to-metal (IMT) phase transition by collapsing their electronic bandgap under a certain external stimulus. Here, we report for the first time the electronic and optoelectronic characterization of ultra-thin n-n heterojunctions fabricated using deterministic assembly of multilayer molybdenum disulphide (MoS2) on a phase transition material, vanadium dioxide (VO2). The vdW MoS2/VO2 heterojunction combines the excellent blocking capability of an n-n junction with a high conductivity in on-state, and it can be turned into a Schottky rectifier at high applied voltage or at temperatures higher than 68 °C, exploiting the metal state of VO2. We report tunable diode-like current rectification with a good diode ideality factor of 1.75 and excellent conductance swing of 120 mV/dec. Finally, we demonstrate unique tunable photosensitivity and excellent junction photoresponse in the 500/650 nm wavelength range.

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In this work we report a new class of ultra-thin film devices based on n-n van der Waals (vdW) heterojunctions of MoS2 and VO2, which show remarkable tunable characteristics. The favorable band alignment combined with the sharp and clean vdW interface determines a tunable diode-like characteristic with a rectification ratio larger than 10 3. Moreover, the heterojunction can be turned into a Schottky rectifier with higher on-current by triggering the VO2 insulator to metal transition (IMT), by either applying a sufficiently large voltage or increasing the temperature above 68 °C. The proposed devices are photosensitive with linear photoresponse and temperature tunable photoresponsivity values larger than 1 in the 500/650 nm wavelength range. We finally report the first ever field-effect transistor based on gated MoS2/VO2 heterojunctions, which is a true low power FET exploiting a phase change material where the electrostatic doping effect of the gate on the junction results in a subthreshold slope (SS) of 130 mV/dec at room temperature, ION/IOFF > 10 3 and IOFF < 5 pA/μm at VD=1.5V. I.

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