A technique known as thermo-pneumatic (TP) pumping is used to pump fluids on a microfluidic compact disc (CD) back towards the CD center against the centrifugal force that pushes liquids from the center to the perimeter of the disc. Trapped air expands in a TP air chamber during heating, and this creates positive pressure on liquids located in chambers connected to that chamber. While the TP air chamber and connecting channels are easy to fabricate in a one-level CD manufacturing technique, this approach provides only one way pumping between two chambers, is real-estate hungry and leads to unnecessary heating of liquids in close proximity to the TP chamber. In this paper, we present a novel TP push and pull pumping method which allows for pumping of liquid in any direction between two connected liquid chambers. To ensure that implementation of TP push and pull pumping also addresses the issue of space and heating challenges, a multi-level 3D CD design is developed, and localized forced convection heating, rather than infra-red (IR) is applied. On a multi-level 3D CD, the TP features are placed on a top level separate from the rest of the microfluidic processes that are implemented on a lower separate level. This approach allows for heat shielding of the microfluidic process levels, and efficient usage of space on the CD for centrifugal handling of liquids. The use of localized forced convection heating, rather than infra-red (IR) or laser heating in earlier implementations allows not only for TP pumping of liquids while the CD is spinning but also makes heat insulation for TP pumping and other fluidic functions easier. To aid in future implementations of TP push and pull pumping on a multi-level 3D CD, study on CD surface heating is also presented. In this contribution, we also demonstrate an advanced application of pull pumping through the implementation of valve-less switch pumping.

Fluorine doped tin oxide (FTO) thin films were prepared at different deposition temperatures using the spray pyrolysis deposition (SPD) technique. The deposition temperature were ranging from 250°C °C to 450°C and the precursor used was 0.5M of SnCl4.5H2O and 1.527M of NH4F completely dissolved in distilled water. It was observed that the conductivity of the FTO thin film increased with increasing of deposition temperature. At 450°C, it was shown the conductivity became smaller. Surface morphologies of FTO thin films at different deposition temperature had shown that the growth of crystallite particles and its distributions were totally affected by the deposition temperature. The transmittance of FTO thin films was over 80% within the wavelength from 300 nm - 800 nm. Thus, the best deposition temperature to be used is around 350°C to 400°C for depositing the FTO film.

Abstract-Photo-catalysis process needs electron transfer to make reaction happen. In this study we want to propose a material that can make the HeLa cells lysis which is titanium dioxide (TiO 2 ). This paper focus on the growth of rutile phased TiO 2 nanoflowers on FTO substrate for HeLa cells treatment. The surface morphology will be characterized under FESEM and XRD while UV-vis for its optical property. The TiO 2 is fabricated by using hydrothermal method. FESEM analysis shows the size of TiO 2 nanoflowers are in range between 30 nm to 400 nm. The surface topography can be able to give data about its grain size and roughness. The TiO 2 nanoflowers sample are confirm in rutile phase mostly at lattice plane (110). By do studying on the TiO 2 characteristic, we can say that as it is important factor to do HeLa cell treatment.

This paper explains on how to fabricate TiO2 on fluorine-doped tin oxide (FTO) substrate. The properties of FTO surface are electrically conductive, stable under atmosphere condition, chemically inert, mechanically hard, high temperature resistance and high tolerance to physical abrasion. This study focuses on growing titanium dioxide (TiO2) on FTO substrate. TiO2 is deposited onto FTO via hydrothermal method using hydrochloric acid (HCl), de-ionized water and titanium butoxide (TBOT) as precursor. The analyses are done on field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM) and spectrophotometer (UV-Vis). The TiO2 grow on FTO substrate is showing uniformity and efficiency to be applied later in application of dye synthesis solar cells. Thus TiO2 can absorb the light and spread the electrons faster to produce electricity.

Abstract. Aim of this paper is to investigate the effect of annealing time of titanium oxide (TiO 2 ) thin film on structural and electrical properties. TiO 2 were deposited onto glass substrates by spray pyrolysis method. The thin films were annealed at three different annealing time; 1, 5 and 10 hours at 400°C. The structural and electrical properties were characterized using FESEM, I-V probe and solar simulator. Polycrystalline thin film with anatase crystal structure, as evidenced from X-ray diffraction pattern, was obtained with major reflection along (101). As anneal time increased the crystallite grain size is increased, thickness of TiO 2 decreased, power conversion efficiency, Ƞ increased from 0.0001% to 2.28% and percentage of IPCE increased at 520nm for transmission spectra of DSSC.