Exfoliation of optical thin films at high humidity in the air is serious problem. Deterioration of three kind of optical thin films deposited on three types of substrate with different water-resistance (phosphate glass LHG-8, BK-7, and fused silica glass) at high humidity condition was studied. Thin films deposited on fused silica glass with highest waterresistance showed a best result for the exfoliation problem. Silica film seemed to be best for the surface observation at high humidity, but the laser-induced damage threshold(LIDT) was considerably lowered.

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Optical coatings deposited by conventional evaporation processes have a number of shortcomings including weak adhesion which depends upon the subsurface condition of substrate and the change of spectral characteristics in the relative humidity. Thin films deposited by reactive-rf-magnetron sputtering improve these problems. Laser-induced damage thresholds (LIDTs) at 355nm, measured by l-on-l and R-on-l methods, of substrate and single high index zirconia, hafnia and aluminum oxide, and low-index silicon dioxide coated by magnetron sputtering, are reported.

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