We investigate the origin of the variation in resistive switching hysteresis of VO2 thin films. Using pulsed electrical measurements in textured VO2 thin film devices, we show that the hysteresis observed in I–V curves results from Joule heating effects, particularly in the low-resistance state. The hysteresis is reduced by increasing the cooling time between pulses. Based on a mechanism of Joule heating-induced metal-insulator transition, numerical simulations are performed, which agree with the experimental variation in the hysteresis. Finally, a framework for engineering the I–V curves of VO2 devices is proposed.

The ability of VO 2 to undergo semiconductor-to-metal phase transition (SMT) upon heating makes it a very attractive material for uncooled bolometers. The SMT of VO 2 represents a large temperature coefficient of resistance, which is an important parameter for the development of highly responsive microbolometers. However, other characteristics of the SMT of VO 2 such as its high transition temperature (341.2 K), the sharpness of the transition, its hysteresis, and the high room temperature resistivity limit the performance of this material in microbolometers. In this work, we grow a high-quality epitaxial ultrathin film VO 2 on c-plane Al 2 O 3 by pulsed laser deposition. The low deposition temperature and tuning the oxygen partial pressure during the growth process enable control over the grain size and oxygen vacancy concentration. This allowed controlling the SMT parameters of the samples. In particular, we show that the high density of grain boundaries associated with nanosized grains suppresses the thermal hysteresis of the SMT. Simultaneous control over the density of oxygen vacancies and the size of grains enables the adjustment of the temperature coefficient of resistance, room temperature resistivity, SMT temperature, sharpness, and thermal hysteresis toward suitable values for the fabrication of efficient VO 2 -based uncooled bolometers. Compared with other VO 2 fabrication methods, this approach can be viewed as a simpler alternative for VO 2 fabrication with favorable properties for practical bolometer applications.

The strongly correlated electron material, vanadium dioxide (VO2), has seen considerable attention and research application in metal-oxide electronics due to its metal-to-insulator transition close to room temperature. Vacuum annealing a V2O5(010) single crystal results in Wadsley phases (VnO2n+1, n > 1) and VO2. The resistance changes by a factor of 20 at 342 K, corresponding to the metal-to-insulator phase transition of VO2. Macroscopic voltage-current measurements with a probe separation on the millimetre scale result in Joule heating-induced resistive switching at extremely low voltages of under a volt. This can reduce the hysteresis and facilitate low temperature operation of VO2 devices, of potential benefit for switching speed and device stability. This is correlated to the low resistance of the system at temperatures below the transition. High-resolution transmission electron microscopy measurements reveal a complex structural relationship between V2O5, VO2 and V6O13 crystallites. Percolation paths incorporating both VO2 and metallic V6O13 are revealed, which can reduce the resistance below the transition and result in exceptionally low voltage resistive switching.