Simultaneous mass production of high quality vertically oriented graphene nanostructures and doping them by using an inductively coupled plasma chemical vapor deposition (ICP CVD) is a technological problem because little is understood about their growth mechanism over enlarged surfaces. We introduce a new method that combines the ICP CVD with roll-to-roll technology to enable the in-situ preparation of vertically oriented graphene by using propane as a precursor gas and nitrogen or silicon as dopants. This new technology enables preparation of vertically oriented graphene with distinct morphology and composition on a moving copper foil substrate at a lower cost. The technological parameters such as deposition time (1–30 min), gas partial pressure, composition of the gas mixture (propane, argon, nitrogen or silane), heating treatment (1–60 min) and temperature (350–500 °C) were varied to reveal the nanostructure growth, the evolution of its morphology and heteroatom’s intercalation by nitrogen or silicon. Unique nanostructures were examined by FE-SEM microscopy, Raman spectroscopy and energy dispersive X-Ray scattering techniques. The undoped and nitrogen- or silicon-doped nanostructures can be prepared with the full area coverage of the copper substrate on industrially manufactured surface defects. Longer deposition time (30 min, 450 °C) causes carbon amorphization and an increased fraction of sp3-hybridized carbon, leading to enlargement of vertically oriented carbonaceous nanostructures and growth of pillars.

В настоящее время для получения структур с нанометровыми толщинами слоев и резкими границами раздела между ними в производстве интегральных микросхем применяются процессы атомно-слоевого осаждения и магнетронного распыления. Однако существуют процессы ионно-лучевого и реактивного ионно-лучевого осаждения, которые в основном используются для получения многослойных оптических покрытий. Исследована возможность получения структур с нанометровыми толщинами слоев и резкими границами раздела между ними в процессах ионно-лучевого и реактивного ионно-лучевого осаждения. Исследования проведены методами времяпролетной вторичной ионной масс-спектрометрии и спектральной эллипcометрии. На примере структуры Ta (3 нм)/Nb (3 нм)/Ta (3 нм) впервые показано, что процесс ионно-лучевого осаждения позволяет формировать структуры с нанометровыми толщинами слоев и резкими границами раздела между ними. Тогда как в процессе реактивного ионно-лучевого осаждения структуры Nb (3 нм)/Ta2 O5 (3 нм)/Nb (3 нм) происходит окисление на всю толщину металлического слоя, следующего за слоем оксида металла, за счет ионов, атомов и молекул кислорода, содержащихся в ионном пучке.

At present, atomic layer deposition and magnetron sputtering processes are used in the production of integrated circuits (IC) to obtain structures with nanometer layer thicknesses and sharp interfaces between them. However, there are also ion-beam and reactive ion-beam deposition processes, which are mainly used to produce multilayer optical coatings. The aim of this work is to study the possibility of obtaining structures with nanometer layer thicknesses and sharp interfaces between them in the processes of ion-beam and reactive ion-beam deposition. The studies were carried out by time-of-flight secondary ion mass spectrometry (SIMS) and spectral ellipsometry methods. Study of the structure Ta (3 nm)/Nb (3 nm)/Ta (3 nm) reveals that ion-beam deposition can form structures with nanometer layer thicknesses and sharp boundaries between them. On the other hand, in reactive ion-beam deposition of the structure Nb (3 nm)/Ta 2 O 5 (3 nm)/Nb (3 nm), oxidation occurs on the entire thickness of the metal layer following the metal oxide layer due to ions, atoms, and molecules of oxygen contained in the ion beam.

The aim of the work is to develop vacuum technological equipment for deposition an interference antireflection coating with the evaporation of a hydrophobic protective layer in a single vacuum cycle. To deposition an interference antireflection coating, the method of magnetron reactive sputtering in the alternating current mode with a frequency of 20 kHz is used. This method allows using of a wide range of sputtered materials and obtains stable and high-quality coatings on various substrates. To determine the optical characteristics, a spectrophotometer was used, which evaluated the transmittance and reflection in the visible region of the spectrum of electromagnetic radiation. To check the physical characteristics of the hydrophobic coating, abrasion test of the coating with metal wool with a load of 1 kg/cm2 was used. The novelty of the presented method is the combination of the liquid-phase coating method together with physical deposition in a vacuum without interrupting the process. This method allows increasing productivity and yield of suitable parts since the number of operations at the multi-stage stage of production of the touch display is reduced. After the development and adjustment of the Aurora G5 linear vacuum equipment, a stable and reproducible process for producing hydrophobic anti-reflective coatings over large areas with high performance was obtained. An antireflection coating was obtained with an average reflection coefficient of less than 0.6 % in the wavelength range of 400 to 700 nm. The adhesion test showed grade 0 according to the ISO classification. The resulting coatings have high hardness >9 H and abrasion resistance >5000 cycles. The result of this development and research is the introduction of vacuum processing equipment in the manufacturing process for the manufacture of anti-reflective hydrophobic coatings on touch displays.