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Extremely thin gold layers were sputter deposited on glass and silicon substrates, and their thickness and morphology were studied by Rutherford backscattering (RBS) and atomic force microscopy (AFM) methods. The deposited layers change from discontinuous to continuous ones for longer deposition times. While the deposition rate on the silicon substrate is constant, nearly independent on the layer thickness, the rate on the glass substrate increases with increasing layer thickness. The observed dependence can be explained by a simple kinetic model, taking into account different sticking probabilities of gold atoms on a bare glass substrate and regions with gold coverage. Detailed analysis of the shape of the RBS gold signal shows that in the initial stages of the deposition, the gold layers on the glass substrate consist of gold islands with significantly different thicknesses. These findings were confirmed by AFM measurements, too. Gold coverage of the silicon substrate is rather homogeneous, consisting of tiny gold grains, but a pronounced worm-like structure is formed for the layer thickness at electrical continuity threshold. On the glass substrate, the gold clusters of different sizes are clearly observed. For later deposition stages, a clear tendency of the gold atoms to aggregate into larger clusters of approximately the same size is observed. At later deposition stages, gold clusters of up to 100 nm in diameter are formed.

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The paper is focused on the preparation and surface characterization of gold coatings and nanostructures deposited on glass substrate. Different approaches for the layer preparation were applied. The gold was deposited on the glass with (i) room temperature, (ii) glass heated to 300°C, and (iii) the room temperature-deposited glass which was consequently annealed to 300°C. The sheet resistance and concentration of free carriers were determined by the van der Pauw method. Surface morphology was characterized using an atomic force microscopy. The optical properties of gold nanostructures were measured by UV–vis spectroscopy. The evaporation technique combined with simultaneous heating of the glass leads to change of the sheet resistance, surface roughness, and optical properties of gold nanostructures. The electrically continuous layers are formed for significantly higher thickness (18 nm), if the substrate is heated during evaporation process. The annealing process influences both the structure and optical properties of gold nanostructures. The elevated temperature of glass during evaporation amplifies the peak of plasmon resonance in the structures, the surface morphology being significantly altered.