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Single-and double-charged 232 Th and 229 Th ions were produced by laser ablation of solid-state thorium compounds and by inductively coupled plasma techniques with mass-spectrometry analysis from liquid solutions of thorium. The latter method was found to be more applicable for producing ions of radioactive 229 Th for laser experiments when searching for the energy value of the isomeric nuclear transition.

We report the results of experimental studies related to implantation of thorium ions into thin silicon dioxide by pulsed plasma fluxes expansion. Thorium ions were generated by laser ablation from a metal target, and the ionic component of the laser plasma was accelerated in an electric field created by the potential difference (5, 10 and 15 kV) between the ablated target and SiO 2 /Si (001) sample. Laser ablation system installed inside the vacuum chamber of the electron spectrometer was equipped with YAG:Nd3+ laser having the pulse energy of 100 mJ and time duration of 15 ns in the Q-switched regime. Depth profile of thorium atoms implanted into the 10 nm thick subsurface areas together with their chemical state as well as the band gap of the modified silicon oxide at different conditions of implantation processes were studied by means of X-ray photoelectron spectroscopy (XPS) and Reflected Electron Energy Loss Spectroscopy (REELS) methods. Analysis of chemical composition showed that the modified silicon oxide film contains complex thorium silicates. Depending on local concentration of thorium atoms, the experimentally established band gaps were located in the range of 6.0 -9.0 eV. Theoretical studies of optical properties of the SiO 2 and ThO 2 crystalline systems have been performed by ab initio calculations within hybrid functional. Optical properties of the SiO 2 /ThO 2 composite were interpreted on the basis of Bruggeman effective medium approximation. A quantitative assessment of the yield of isomeric nuclei in "hot" laser plasma at the early stages of expansion has been performed. The estimates made with experimental results demonstrated that the laser implantation of thorium ions into the SiO 2 matrix can be useful for further research of low-lying isomeric transitions in 229 Th isotope with energy of 7.8 ± 0.5 eV.

The results are presented on the study of the electronic structure of thorium atoms adsorbed by the liquid atomic layer deposition from aqueous solution of thorium nitrate on the surface of CaF 2 . The chemical state of the atoms and the change of the band structure in the surface layers of Th/CaF 2 system on CaF 2 substrate were investigated by XPS and REELS techniques. It was found that REELS spectra for Th/CaF 2 system include peaks in the region of low energy losses (3-7 eV) which are missing in the similar spectra for pure CaF 2 . It is concluded that the presence of the observed features in the REELS spectra is associated with the chemical state of thorium atoms and is caused by the presence of uncompensated chemical bonds at the Th/CaF 2 interface, and, therefore, by the presence of unbound 6d-and 7s-electrons of thorium atoms. Assuming the equivalence of the electronic configuration of thorium-229 and thorium-232 atoms, an estimate was made on the time decay of the excited state of thorium-229 nuclei through the channel of the electron conversion. It was found that the relaxation time is about 40 μs for 6d-electrons, and about 1 μs for 7s-electrons.