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An approach based on the insertion of a CuO layer in YBa 2 Cu 3 O 7−δ (YBCO)-coated conductor was proposed and demonstrates high current-carrying ability. The multilayer architecture was deposited on oxid-buffered Hastelloy tapes using a metal organic deposition (MOD) process (low-fluorine solution route). It was revealed that the introduction of a CuO layer was effective to avoid the presence of a-axis grain and pores of the YBCO films, which were frequently observed in multilayer films. Presently, the thickness of the multilayer films was almost 1.5 μm. Based on the improvements of the surface quality and c-oriented texture which were proved by X-ray (θ − 2θ, ϕ, and ω)-scan, AFM images, and SEM (surface and crosssection) images, the critical current density (Jc) of YBCO films with middle CuO and bottom CuO are 2.0 MA/cm 2 and 2.5 MA/cm 2 (at 77 K, self-field), respectively.

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