Abstract:Titanium dioxide thin films are extensively studied for applications in solid state gas sensor devices. Their gas sensing properties are strongly dependent on deposition technique, annealing temperature, film thickness and consequent properties like crystalline structure, grain size or amount of defects and impurities. In this work we report the gas sensing properties of TiO 2 thin films prepared by reactive magnetron sputtering technique and subsequently annealed at temperatures 600°C and 900°C. The films were exposed to different concentrations of H 2 gas up to 10 000 ppm. Their sensitivity to gas at various operating temperatures, ranging from 250°C to 450°C, was obtained by measuring their resistance. 07.07.Df, 68.47.Gh, 73.25.+i, 82.47 PACS (2008):

The rapid emergence of gallium-nitride (GaN) light-emitting diodes (LEDs) for solid-state lighting has created a timely opportunity for optical communications using visible light. One important challenge to address this opportunity is to extend the wavelength coverage of GaN LEDs without compromising their modulation properties. Here, a hybrid source for emission at 540 nm consisting of a 450 nm GaN micro-sized LED (micro-LED) with a micron-thick ZnCdSe/ZnCdMgSe multi-quantum-well color-converting membrane is reported. The membrane is liquid-capillary-bonded directly onto the sapphire window of the micro-LED for full hybridization. At an injection current of 100 mA, the color-converted power was found to be 37 μW. At this same current, the −3 dB optical modulation bandwidth of the bare GaN and hybrid micro-LEDs were 79 and 51 MHz, respectively. The intrinsic bandwidth of the color-converting membrane was found to be power-density independent over the range of the micro-LED operation at 145 MHz, which corresponds to a mean carrier lifetime of 1.9 ns.

Multiple layers of InP QDs, self-assembled during epitaxial growth, were incorporated into the active region of an (Al(x)Ga(1-x))(0.51)In(0.49)P based semiconductor disk laser with monolithic Al(x)Ga(1-x)As distributed Bragg reflector. Three gain structure samples were selected from the epitaxial wafer, bonded to single-crystal diamond heatspreaders and optically pumped at 532 nm within a high finesse external laser cavity. Laser emission with peak wavelengths at 716, 729, and 739 nm, respectively, was achieved from the three samples; the latter demonstrating tuning from 729 to 755 nm. Maximum continuous wave output power of 52 mW at 739 nm was achieved with 0.2% output coupling; the threshold and slope efficiency were 220 mW and 5.7% respectively.

One of the potential applications of TiO2 is its use in gas sensor technology. The aim of this work was to study the gas sensing properties of TiO2 thin films in combination with the effect of post-deposition annealing treatment. Titanium dioxide thin films with thickness 100 nm were prepared by the reactive dc magnetron sputtering. The thin films were deposited on sapphire substrate from a titanium target in an oxygen atmosphere. The samples were then post-annealed in air in the temperature range 600 °C 1000 °C. Crystal structure, surface topography and absorption edge of the thin films have been studied by X-ray Diffraction technique, Atomic Force Microscopy and UV-VIS Spectroscopy. It was found that the phase gradually changed from anatase to rutile, the grain size and roughness tended to increase with increasing post-annealing temperature. The effect of these factors on gas sensing properties was discussed. For electrical measurements comb-like Pt electrodes were prepared by standard photolithography and the films were exposed to different concentrations of H2 gas up to 10000 ppm in synthetic air at various operating temperatures from 200 °C to 350 °C.

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