A highly relaxed InGaN buffer layer was demonstrated over a full two-inch c-plane sapphire substrate by metalorganic chemical vapor deposition. The InGaN buffer layer was grown on a 100 nm GaN decomposition stop layer with a 3 nm thick high indium composition InGaN underlayer. After thermal decomposition of the underlayer at 1000 °C, a 200 nm thick In0.04Ga0.96N buffer showed 85% biaxial relaxation measured by a high resolution x-ray diffraction reciprocal space map. When used as a pseudo-substrate for the regrowth of InGaN/InGaN multi-quantum wells, the sample showed a 75 nm red-shift in room temperature photoluminescence when compared to a co-loaded GaN template reference. The longer emission wavelength is associated with higher indium incorporation in the InGaN layers from the lessening of the compositional pulling effect caused by compressive strain. Using this technique, a simple red light emitting diode was demonstrated with an active layer growth temperature of 825 °C and a peak wavelength of 622 nm at a current density of 20 A cm−2. This work represents a unique method to relax a III-nitride based layer over a full substrate.

Red LEDs were grown by metalorganic chemical vapor deposition with a high active region temperature of 870 °C on a relaxed InGaN/GaN superlattice buffer. The buffer was 100% biaxially relaxed by the thermal decomposition of an InGaN underlayer, measured by high resolution X-ray diffraction. Fabricated LEDs showed a low forward voltage of 2.25 V at a current density of 25 Acm −2 with no Al-containing layers in the active region, a peak emission wavelength of 633 nm at 200 Acm −2 and an on-wafer peak external quantum efficiency of 0.05%. Uniform red emission and relaxation were observed across a two inch substrate.

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InGaN-based red micro-size light-emitting diodes (μLEDs) have become very attractive. Compared to common AlInGaP-based red µLEDs, the external quantum efficiency (EQE) of InGaN red µLEDs has less influence from the size effect. Moreover, the InGaN red µLEDs exhibit a much more robust device performance even operating at a high temperature of up to 400 K. We review the progress of InGaN red μLEDs. Novel growth methods to relax the strain and increase the growth temperature of InGaN red quantum wells are discussed.

Single-frequency blue laser sources are of interest for an increasing number of emerging applications but are still difficult to implement and expensive to fabricate and suffer from poor robustness. Here a novel and universal grating design to realize distributed optical feedback in visible semiconductor laser diodes (LDs) was demonstrated on a semipolar InGaN LD, and its unique effect on the laser performance was investigated. For the first time, to the best of our knowledge, a low threshold voltage, record-high power output, and ultra-narrow single-mode lasing were simultaneously obtained on the new laser structure with a thinner p-GaN layer and a third-order phase-shifted embedded dielectric grating. Under continuous-wave operation, such 450 nm lasers achieved 35 dB side-mode suppression ratio, less than 2 pm FWHM, and near 400 mW total output power at room temperature.