Production of antibodies against peptides or poorly antigenic proteins by conventional methods often requires either large quantities of the native immunogen or some chemical modification to increase their antigenicity. In this study an in vivo and in vitro immunization protocol has been used to generate monoclonal antibodies against the decapeptide luteinizing hormone-releasing hormone (LHRH). Two injections of 100 micrograms of avian LHRH-I into BALB/c mice were given 7 d apart. Dissociated splenocytes were collected under sterile conditions. They were incubated with 100 micrograms of the immunogen in 75-cm2 tissue culture flasks in thymocyte-conditioned media. After 5 to 8 d exposure to the antigen, splenocytes were fused with SP2/O myeloma cells by polyethylene glycol. The cells were plated into 24 wells and then incubated in hypoxanthine aminopterin and thymidine selective media. After 14 d an initial screening was done by enzyme immunoassay. The positive wells (6/24) were expanded into 96-well plates and rescreened. Selected lines were cloned out 3 times by limiting dilution and the most positive expanded for ascites production. The antibody was affinity purified in a protein A column. The antibody cross-reacted with LHRH-I and II but preferentially to LHRH-I, as shown by competitive assay. A hypothalamic extract from a mature chick showed a higher response than preparations from whole brain explants of 1- to 3-d posthatched chicks, mature quail, and mature mouse.

Application of MEMS angular rate gyro attitude when monitoring for long-term, zero-point drift and random error in cumulative points after long-term monitoring errors can significantly increase the measurement error. Using ARMA model of MEMS gyros random drift modeling and error compensation method using Adaptive Kalman Filter, which increases gyro attitude measurement of long-term reliability Last experiment. The method in accordance with the principle of time series analysis, integration of observations and estimates of actual system so that it can reflect the influence of external disturbance and noise on the system. It can also reflect the influence of system disturbance on actual system performance improves estimation precision.

Novel reaching law to nonsingular terminal sliding mode control for the control of the second order nonlinear uncertain system is introduced in this paper. The problems of singularity, chattering and slow convergence of the terminal sliding mode control, and verify the stability of the new controller is analyzed. Due to the premise of eliminating the singular value in the nonsingular terminal sliding mode control, the new reaching law based on the power reaching law enables the finite time convergence of the system equilibrium. By applying the new controller to the inverted pendulum system, the sliding surface had been proved fast and the system chattering had been reduced at the same time. Simulation results indict that the system converges to the equilibrium in a short time and the proposed method is feasible and effective.

The equipment storage condition monitoring technology research equipment equipment full life cycle environmental temperature and humidity, vibration impact stress and location information such as the attitude of the real-time data acquisition and processing analysis of equipment equipment maintenance and management is the effective supplement. Based on the equipment storage state information definition warning rate new indicators, and establish the ARMA forecasting model. performance is not the same as the state of the difference between the equipment equipment change maintenance and quality management plan.

The positive photoresist AZ4620 was used for thick photoresist lithography of glass microfluidic chip. Different test temperature of soft baking, post exposure baking, hard baking, impacted the surface quality of photoresist layer, the adhesion of photoresist and glass matrix, the photoresist tolerance time, the etching rate and the maximum etching depth. The results show that the soft-bake temperature of 80°C improves the adhesion of the photoresist and the glass substrate well; PEB (post exposure bake) temperature of 60~70°Chelps to the quality of graphics after development; hard bake temperature of 80~90°Ccan conducive to a larger etching depth; through the controlling of heating temperature and mixing rate, it effectively improves the etching rate, increases the etching depth as well. It has been applied to the fast and high-volume production of a certain microfluidic detection chips.