A maskless lithography method to realize the rapid and cost-effective fabrication of micro-optics elements with arbitrary surface profiles is reported. A digital micro-mirror device (DMD) is applied to flexibly modulate that the exposure dose according to the surface profile of the structure to be fabricated. Due to the fact that not only the relationship between the grayscale levels of the DMD and the exposure dose on the surface of the photoresist, but also the dependence of the exposure depth on the exposure dose, deviate from a linear relationship arising from the DMD and photoresist, respectively, and cannot be systemically eliminated, complicated fabrication art and large fabrication error will results. A method of compensating the two nonlinear effects is proposed that can be used to accurately design the digital grayscale mask and ensure a precise control of the surface profile of the structure to be fabricated. To testify to the reliability of this approach, several typical array elements with a spherical surface, aspherical surface, and conic surface have been fabricated and tested. The root-mean-square (RMS) between the test and design value of the surface height is about 0.1 μm. The proposed method of compensating the nonlinear effect in maskless lithography can be directly used to control the grayscale levels of the DMD for fabricating the structure with an arbitrary surface profile.

We report a method of boosting the imaging contrast of microsphere-assisted super-resolution visualization by utilizing dark-field illumination (DFI). We conducted experiments on both 10-µm-diameter silica (SiO2) microspheres with refractive index n ∼ 1.46 under no and partial immersion in ethyl alcohol (n ∼ 1.36) and 20-µm-diameter barium titanate glass (BTG, n ∼ 1.9) microspheres with full immersion to show the super-resolution capability. We experimentally demonstrated that the imaging contrast and uniformity were extraordinarily improved in the DFI mode. The intensity profiles in the visualization also numerically confirm the enhanced sharpness for a better imaging quality when applying DFI.

In this research, an approach called modulation-based structured-illumination microscopy (MSIM) is proposed to measure the surface and thickness profile of thin film layers. With this method, a sinusoidal fringe pattern generated by digital micro-mirror devices (DMD) is projected on the sample. The modulation estimation of the reflected patterns is implemented for characterizing the surface and thickness profile of the sample. The measurement system is relatively simple and only an ordinary objective is enough to achieve imaging of the sample. In addition, the reflected signals come from the back surface of the film create less disturbance to the front surface compared with white-light interferometry. Consequently, they can be easily distinguished and achieve a successful measurement precisely. Both simulation and experiments are carried out to demonstrate the availability of this MISM method. The results are in excellent agreement with commercial stage profiler and the relative uncertainty is less than 10 nm.