The use of non-ideal reflective materials and low-precision manual manufacturing technologies is a fundamental technical obstacle blocking the positron emission tomography (PET) systems from achieving better performances. We propose to address that long-standing obstacle with advanced multilayer dielectric coating technologies. We designed an broad-band multilayer high-reflectivity (HR) film that can be coated directly on the surface of ultra-precision polished lutetium-yttrium oxyorthosilicate (LYSO) scintillators. The film consists of 48 layers of TiO2/SiO2/HfO2 which are deposited on LYSO scintillator crystal alternately using the electron beam evaporation method. The overall thickness of the HR film is about 3μm. The HR film combines 3 quarter wavelength reflective films, with the central wavelengths of 365 nm, 430 nm and 570 nm respectively, to match the emission spectrum of the LYSO scintillator. The optical experimental results show that the HR film achieved an excellent average reflectivity of 99.50% at 8̂ incident angle for incident lights with wavelengths between 360 to 620 nm. The average reflectivity at 60̂ incident angle is higher than 90%. The results of the hardness experiments and the adhesive strength experiments show that the HR film has an excellent mechanical strength. The HR coating technology developed in this study is very attractive because it allows to “print” high-performance reflectors on a scintillator directly with high-precision, instead of manually gluing reflective films on the scintillator. Thus, we conclude that the HR film provides a viable solution to the long standing technical bottleneck that limits the development of high-performance detectors for advanced PET imaging.

Designed micro-nano structures on the surface of aluminum alloy provide excellent light trapping properties that can be used extensively in thermal photovoltaics, sensors, etc. However, the fabrication of high-performance antireflective micro-nano structures on aluminum alloy is challenging because aluminum has shallow intrinsic losses and weak absorption. A two-step strategy is proposed for fabricating broadband antireflection structures by superimposing nanostructures onto microscale structures. By optimizing the processing parameters of femtosecond laser, the average reflectances of 2.6% within the visible spectral region (400–800 nm) and 5.14% within the Vis-NIR spectral region (400–2500 nm) are obtained.

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In this paper, a high-precision, low-cost, batch processing nanoimprint method is proposed to process a spherical microlens array (MLA). The nanoimprint mold with high surface precision and low surface roughness was fabricated by single-point diamond turning. The anti-sticking treatment of the mold was carried out by perfluorooctyl phosphoric acid (PFOPA) liquid deposition. Through the orthogonal experiment of hot embossing with the treated mold and subsequent inductively coupled plasma (ICP) etching, the microstructure of MLA was transferred to the silicon substrate, with a root mean square error of 17.7 nm and a roughness of 12.1 nm Sa. The average fitted radius of the microlens array units is 406.145 µm, which is 1.54% different from the design radius.