Techniques for recording, replicating, and reconstructing relief phase holograms are described. Replication is accomplished by embossing the relief pattern into transparent plastic using a metal master prepared by plating holograms exposed in photoresist. Image noise is reduced, without producing speckle patterns, by redundant recording. A motion picture, in the form of a sequence of Fraunhofer holograms embossed into a plastic tape, can be played out very simply because of the image immobilization of that type of hologram.

Recording of relief phase holograms in Shipley AZ-1350 positive photoresist is investigated in this report. It is found that the use of Shipley AZ-303 developer with Shipley AZ-1350 photoresist relieves the material nonlinearity usually associated with photoresists, thereby allowing higher image readout efficiencies. The use of Shipley AZ-303 developer also provides an increase in material sensitivity. A theoretical model for positive photoresist exposure characteristics is developed and verified by empirical results. Using Shipley AZ-303 developer, a design procedure for recording useful (i.e., acceptable SNR > 25 dB, high efficiency ~3-5%, exposure sensitivity ~ a few mJ.cm(-2)) relief phase holograms in Shipley AZ-1350 positive photoresist is synthesized.

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The optical-recording characteristics of a fully encapsulated Te trilayer structure are reported. The results demonstrate a 400% improvement in sensitivity compared to a Ti trilayer, at a recording wavelength of 488 nm, while maintaining high SNR (≳50 dB) on playback. This Te trilayer can be optimized for use with a GaAs diode laser recording system.

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