Polycrystalline diamond (PCD) was grown onto high-k dielectric passivated AlGaN/GaN-on-Si high electron mobility transistor (HEMT) structures, with film thicknesses ranging from 155 to 1000 nm. Transient thermoreflectance results were combined with device thermal simulations to investigate the heat spreading benefit of the diamond layer. The observed thermal conductivity (κDia) of PCD films is one-to-two orders of magnitude lower than that of bulk PCD and exhibits a strong layer thickness dependence, which is attributed to the grain size evolution. The films exhibit a weak temperature dependence of κDia in the measured 25–225 °C range. Device simulation using the experimental κDia and thermal boundary resistance values predicts at best a 15% reduction in peak temperature when the source-drain opening of a passivated AlGaN/GaN-on-Si HEMT is overgrown with PCD.

We report on the fabrication and electrical characterization of epitaxial Schottky diodes of a half-metallic ferromagnet on an oxide semiconductor. La0.67Sr0.33MnO3 thin films are grown by pulsed laser deposition on niobium-doped SrTiO3 semiconductor substrates with two doping concentrations and a TiO2 surface termination. The current across the diodes is dominated by thermionic emission and shows high rectification and low reverse bias leakage. At room temperature, the Schottky barrier height is 0.95 eV (0.65 eV) and the ideality factor is 1.08 (1.18) for the diodes with a low (high) doped semiconductor. With decreasing temperature the Schottky barrier height decreases and the ideality factor increases.

The observation of the anomalous Hall effect (AHE) in Co-doped TiO2 ferromagnetic semiconductor in the anatase phase is reported. An AHE is observed with magnetic hysteresis consistent with remanence and coercivity obtained from magnetometry data. The anatase films also have reasonable mobility (∼17cm2∕Vs) at room temperature and carrier density of ∼5×1018cm−3. The AHE in such films with relatively low carrier density gives prospects to test whether the ferromagnetism in this oxide semiconductor is carrier mediated using a field effect device configuration.

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