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A novel and versatile plasma reactor was used to modify Polyethersulphone commercial membranes. The equipment was applied to: i) functionalize the membranes with low-temperature plasmas, ii) deposit a film of poly(methyl methacrylate) (PMMA) by Plasma Enhanced Chemical Vapor Deposition (PECVD) and, iii) deposit silver nanoparticles (SNP) by Gas Flow Sputtering. Each modification process was performed in the same reactor consecutively, without exposure of the membranes to atmospheric air. Scanning electron microscopy and transmission electron microscopy were used to characterize the particles and modified membranes. SNP are evenly distributed on the membrane surface. Particle fixation and transport inside membranes were assessed before- and after-washing assays by X-ray photoelectron spectroscopy depth profiling analysis. PMMA addition improved SNP fixation. Plasma-treated membranes showed higher hydrophilicity. Anti-biofouling activity was successfully achieved against Gram-positive (Enterococcus faecalis) and -negative (Salmonella Typhimurium) bacteria. Therefore, disinfection by ultrafiltration showed substantial resistance to biofouling. The post-synthesis functionalization process developed provides a more efficient fabrication route for anti-biofouling and anti-bacterial membranes used in the water treatment field. To the best of our knowledge, this is the first report of a gas phase condensation process combined with a PECVD procedure in order to deposit SNP on commercial membranes to inhibit biofouling formation.

In this work, the synthesis of Pt and Ag nanoparticles by means of the inert gas phase condensation of sputtered atomic vapor is presented. The process parameters (power, sputtering time, and gas flow) were varied in order to study the relationship between deposition conditions and properties of the nanoparticles such as their quantity, size, and size distribution. Moreover, the gas phase condensation process can be combined with a plasma enhanced chemical vapor deposition procedure in order to deposit nanocomposite coatings consisting of metallic nanoparticles embedded in a thin film matrix material. Selected examples of application of the generated nanoparticles and nanocomposites are discussed

Results for a new 60 MHz plasma‐enhanced chemical vapour deposition (PECVD) apparatus developed for roll‐to‐roll processes of polymeric substrates are presented. Using silicon organic precursors in an oxygen plasma, thin film properties could be varied from inorganic silicon oxide to siloxane plasma polymers by varying the precursor content or by pulsing the plasma without changing the gas composition. The transition from inorganic oxide to plasma polymer was investigated by infrared spectroscopy and contact angle measurements. A process was introduced to produce an inorganic‐plasma polymer multilayer.

In this work we present a new plasma deposition apparatus developed for the effective plasma polymer deposition on polymeric substrates. It consists of a specially designed plasma reactor with a 60 MHz capacitively coupled electrode and an adapted substrate holder to implement roll-to-roll processes. Using siliconorganic precursors the high deposition rates required for industrial scale deposition on plastic films are achieved. The deposition mechanism is characterized by deposition rate as a function of power and monomer flow. Infrared spectroscopy investigation of the deposited thin films confirm the ability to include functional groups in siliconorganic and pure hydrocarbon plasma polymers in the 60 MHz plasma.PACS : 81.15.Gh