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We present a domain decomposition approach for the computation of the electromagnetic field within periodic structures. We use a Schwarz method with transparent boundary conditions at the interfaces of the domains. Transparent boundary conditions are approximated by the perfectly matched layer method (PML). To cope with Wood anomalies appearing in periodic structures an adaptive strategy to determine optimal PML parameters is developed.We focus on the application to typical EUV lithography line masks. Light propagation within the multi-layer stack of the EUV mask is treated analytically. This results in a drastic reduction of the computational costs and allows for the simulation of next generation lithography masks on a standard personal computer.

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We present our simulation tool JCMmode for calculating propagating modes of an optical waveguide. As ansatz functions we use higher order, vectorial elements (Nedelec elements, edge elements). Further we construct transparent boundary conditions to deal with leaky modes even for problems with inhomogeneous exterior domains as for integrated hollow core Arrow waveguides. We have implemented an error estimator which steers the adaptive mesh refinement. This allows the precise computation of singularities near the metal's corner of a Plasmon-Polariton waveguide even for irregular shaped metal films on a standard personal computer.

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