Domain decomposition method for Maxwell’s equations: Scattering off periodic structures

Abstract

We present a domain decomposition approach for the computation of the electromagnetic field within periodic structures. We use a Schwarz method with transparent boundary conditions at the interfaces of the domains. Transparent boundary conditions are approximated by the perfectly matched layer method (PML). To cope with Wood anomalies appearing in periodic structures an adaptive strategy to determine optimal PML parameters is developed.We focus on the application to typical EUV lithography line masks. Light propagation within the multi-layer stack of the EUV mask is treated analytically. This results in a drastic reduction of the computational costs and allows for the simulation of next generation lithography masks on a standard personal computer.

On accurate simulations of thin-film solar cells with a thick glass superstrate

“…The first order correction resembles experimental data much better then the zeroth order correction. Nanostructured thin-film layer stacks with a thick glass superstrate can also be handled with FEM together with a rigorous domain decomposition approach [6]. During the 2016 OSA PV meeting we also will present results obtained with that approach and compare it to results obtained with the first order correction.…”

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“…and the amplitude vectors t and r can be determined from the interface conditions resulting from the Maxwell equations, see (Yeh, 2005;Schädle et al, 2007). In the vertical problem the multilayer is invariant in the z-and y-directions.…”

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