High fidelity blazed grating replication using nanoimprint lithographyWe report a process which integrates interference lithography, nanoimprint lithography, and anisotropic etching to fabricate replicated diffraction gratings with sawtooth profiles. This new process greatly reduces grating fabrication time and cost, while preserving the groove shape and smoothness. Relief gratings with 400 nm period inverted triangular profiles and 200 nm period gratings with 7°blaze angle were replicated from silicon masters with surface roughness of less than 1 nm. This process was developed for fabricating the off-plane blazed diffraction gratings for the NASA Constellation-X x-ray telescope.

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This article presents the results of a collaborative effort between Molecular Imprints, Inc. (MII) and Photronics, Inc. to develop a baseline process for fabricating Step and Flash Imprint Lithography (S-FIL TM ) templates that are compatible with lithography tools being developed by MII. S-FIL is a replication technique with sub-50nm resolution capability that has the potential to lead to a low cost, high throughput process. Template fabrication results and S-FIL patterning results on 200mm wafers are presented.