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This report details the development of a self-assembled monosilane nanocomposite that possesses unique applicability to the construction of microphotonic circuits. Through exposure to deep ultraviolet radiation, large changes in as deposited index of refraction can be induced through exposure to deep UV (254 nm or less) radiation. The ability to produce materials with Variable In Plane Index of Refraction (VIPIR) permits microphotonic designs to be constructed that are difficult or impossible to construct by conventional means. A silicon donor vapor was introduced and reacted with an organic donor in a central processing chamber to produce a self-assembled monosilane nanocomposite. The deposited film properties can be altered through reactant and deposition condition selection to achieve optimum photosensitivity. Work to date indicates that the ability to use separate organic donor materials and silicon donor materials allows considerably more flexibility in the stoichiometry of the deposited materials than is possible with single component organosilicon reactions. The monosilane embedded nanocomposite material provides a family of index of refractions, as deposited, and photosensitivities. Deposition conditions and organic components are selected to produce higher or lower as deposited index of refraction, photosensitivity and increase or decrease contrast as deposited vs. after photoexposure.

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