The mosaicity of GaN layers grown by metalorganic vapor phase epitaxy, on (0001) sapphire and exhibiting different grain diameters is studied using high-resolution x-ray diffraction. The coherence lengths, the tilt, and the twist of the mosaic structure are determined utilizing data taken in different x-ray scattering geometries. The results of different models, which were applied, are then compared and discussed. The dislocation densities, obtained from the x-ray data, are compared with the results of plan-view transmission electron microscopy and atomic force microscopy.
The formation of dislocations and stress in GaN layers grown by metalorganic vapor phase epitaxy on sapphire is investigated with regard to the average grain diameter. The grain diameter was determined by monitoring the high-temperature GaN island coalescence process during growth using reflectometry. It is found that the density of edge threading dislocations decreases and the compressive stress measured after cooling to room temperature increases when the coalescence thickness and the grain diameter increase. The data are consistent with models of development of tensile stress due to island coalescence during growth.
GaN(0001) epitaxial layers were grown by molecular beam epitaxy on a
few-nanometres thick low-temperature GaN nucleation layers on c-plane
sapphire. Despite extremely high densities of extended defects, the layers
show a narrow (002) x-ray diffraction peak, superimposed by broad diffuse
scattering. Triple-axis transverse and radial scans were measured for (00l)
reflections of different orders and for various GaN layer thicknesses. The
results can be described by an interfacial displacement-difference correlation
function. Its microscopic origin is assigned to either inversion domain
boundaries or edge-type threading dislocations in the GaN layers, in agreement
with findings of transmission electron microscopy. These defects are
associated with an only weak rotational disorder perpendicular to the growth
plane as proven by the x-ray scattering characteristics.
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