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Due to the increasing fabrication and design complexity with new process nodes, the cost per transistor trend originally identified in Moore's Law is slowing when using traditional integration methods. However, emerging die-level integration technologies may be viable alternatives that can scale the number of transistors per integrated device while reducing the cost per transistor through yield improvements across multiple smaller dies. Additionally, the escalating overheads of non-recurring engineering costs like masks and verification can be curtailed through die integration-enabled reuse of intellectual property across heterogeneous process technologies. In this paper, we present an analytical cost model for 3D and interposer-based 2.5D die integration and employ it to demonstrate the potential cost reductions across semiconductor markets. We also propose a methodology and platform for IP reuse based on these integration technologies and explore the available reductions in overall product cost through reduction in non-recurring engineering effort.

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