The paper considers the operational features of the UOKS-3 magnetron sputtering system. The experimentally obtained data indicate that the sputtering rate of the substrate depends on a large number of factors, such as partial pressure of the working and reaction gases, distance between the target and the workpieces, and depth of the groove made on the working surface of the target. Using a comprehensive study of the influence of each of these factors, it is possible to more accurately predict the deposition rate of a ceramic layer of a thermal barrier coating on the surface of the processed products.
ФГУП «Всероссийский научно-исследовательский институт авиационных материалов», ГНЦ РФ, ул. Радио 17, 450001, Москва, Россия В статье обсуждается один из прогрессивных на сегодняшний день способов обработки поверхности с целью по-вышения класса шероховатости и выравнивания текстуры поверхности -электролитно-плазменное полирование. Рассматриваются механизмы зарождения разряда в электролите и их стабильность. Установлены параметры, ока-зывающие определяющее влияние на эффективность процесса электролитно-плазменной обработки стали ЭИ961 и титанового сплава ВТ20. The article is described the one of the most progressive method of surface-treatment -electrolytic-plasma method. The aim of this to decrease surface roughness class. It is described the mechanism forming discharge in electrolytic and its stability. It is established the parameters of process, that influence on effective process of steel and titan alloy.
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