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Thin films continue to become more and more integral to numerous applications in today's advancing technologies. In recent years, thin film science has grown world-wide into a major research area. The importance of coatings and the synthesis of new materials for industry have resulted in a tremendous increase of innovative thin film processing technologies. Thin film properties are strongly dependent on the method of deposition, the substrate temperature, the rate of deposition, the background pressure etc. Hardness, adhesion, non porosity, high mobility of charge carriers / insulating properties and chemical inertness, which are possible with a selection of suitable functional materials and deposition techniques. There are number of different techniques that facilitate the deposition of stable thin films of oxide materials on suitable substrates. Material properties of gallium zinc oxide thin films and all the techniques used to deposit thin films are summarized with an elaborative account along with our results.

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