We study dynamics of pattern formation in systems belonging to class of reaction-Cattaneo models including persistent diffusion (memory effects of the diffusion flux). It was shown that due to the memory effects pattern seletion process are realized. We have found that oscillatory behavior of the radius of the adsorbate islands is governed by finite propagation speed. It is shown that stabilization of nano-patterns in such models is possible only by nonequilibrium chemical reactions. Oscillatory dynamics of pattern formation is studied in details by numerical simulations.

We study pattern formation processes in anisotropic system governed by the Kuramoto-Sivashinsky equation with multiplicative noise as a generalization of the Bradley-Harper model for ripple formation induced by ion bombardment. For both linear and nonlinear systems we study noise-induced effects at ripple formation and discuss scaling behavior of the surface growth and roughness characteristics. It was found that the secondary parameters of the ion beam (beam profile and variations of an incidence angle) can crucially change the topology of patterns and the corresponding dynamics.

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