nanotechnology, with its broad impact on societally relevant applications, relies heavily on the availability of accessible nanofabrication methods. Even though a host of such techniques exists, the flexible, inexpensive, on-demand and scalable fabrication of functional nanostructures remains largely elusive. Here we present a method involving nanoscale electrohydrodynamic ink-jet printing that may significantly contribute in this direction. A combination of nanoscopic placement precision, soft-landing fluid dynamics, rapid solvent vapourization, and subsequent self-assembly of the ink colloidal content leads to the formation of scaffolds with base diameters equal to that of a single ejected nanodroplet. The virtually material-independent growth of nanostructures into the third dimension is then governed by an autofocussing phenomenon caused by local electrostatic field enhancement, resulting in large aspect ratio. We demonstrate the capabilities of our electrohydrodynamic printing technique with several examples, including the fabrication of plasmonic nanoantennas with features sizes down to 50 nm.
Self-mode-locking has become an emerging path to the generation of ultrashort pulses with vertical-external-cavity surface-emitting lasers. In our work, a strong Kerr nonlinearity that is so far assumed to give rise to mode-locked operation is evidenced and a strong nonlinearity enhancement by the microcavity is revealed. We present wavelength-dependent measurements of the nonlinear absorption and nonlinear-refractive-index change in a gain chip using the Z-scan technique. We report negative nonlinear refraction up to 1.5⋅10 -11 cm 2 /W in magnitude in the (InGa)As/Ga(AsP) material system close to the laser design wavelength, which can lead to Kerr lensing. We show that by changing the angle of incidence of the probe beam with respect to the gain chip, the Kerr nonlinearity can be wavelength-tuned, shifting with the microcavity resonance.Such findings may ultimately lead to novel concepts with regard to tailored self-mode-locking behavior achievable by peculiar Kerr-lens chip designs for cost-effective, robust and compact fspulsed semiconductor lasers.The Kerr effect is at the basis of many important device concepts like all-optical switching 1 , optical limiting 2 and soliton mode-locking of lasers and microresonators 3,4 . The capability to accurately measure and model the nonlinear refractive index changes associated with the Kerr effect is crucial for improved device operation, where a specifically tailored nonlinear refractive index is required, e.g. for the intensity-dependent Kerr lensing. Several measurement schemes have been developed in the past for the characterization of the nonlinear refractive index 5-7 , with the Z-scan technique 8 being undoubtedly the most prominent one due to its simplicity and high sensitivity. This method continues to be of high experimental value with the rise of novel material classes like graphene and other two-dimensional semiconductors which often exhibit a very strong refractive nonlinearity 9-11 .Kerr-lens mode-locked Ti:Sapphire lasers have dominated the field of ultra-short high-power modelocked lasers since their initial discovery nearly three decades ago 12,13 . In these lasers, the intensitydependent refractive index of the gain crystal leads to self-focusing of the laser beam for high intensities. When part of the continuous-wave (cw) beam profile is suppressed by inserting a slit into C. Kriso et al. (2018) 2
We correct a mistake in [Opt. Express 27, 11914 (2019)10.1364/OE.27.011914] when calculating the focal length of the Kerr lens with the measured values of the nonlinear refractive index n2 and parameters of a prototypical self-mode-locking VECSEL cavity. We therefore update Fig. 1 of the original publication. The new calculation yields a significantly larger value of the Kerr lens focal length leading to a smaller perturbation of the cavity beam profile.
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