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Graphene is an outstanding electronic material, predicted to have a role in post-silicon electronics. However, owing to the absence of an electronic bandgap, graphene switching devices with high on/off ratio are still lacking. Here in the search for a comprehensive concept for wafer-scale graphene electronics, we present a monolithic transistor that uses the entire material system epitaxial graphene on silicon carbide (0001). This system consists of the graphene layer with its vanishing energy gap, the underlying semiconductor and their common interface. The graphene/semiconductor interfaces are tailor-made for ohmic as well as for schottky contacts side-by-side on the same chip. We demonstrate normally on and normally off operation of a single transistor with on/off ratios exceeding 10 4 and no damping at megahertz frequencies. In its simplest realization, the fabrication process requires only one lithography step to build transistors, diodes, resistors and eventually integrated circuits without the need of metallic interconnects.

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Three topics are reported in this paper: (a) the determination of a temperature-dependent Hall scattering factor for holes r H,h (T) in 4H-SiC, (b) the detection of shallow Al-related defect centers in Al-doped, p-type 6H-/3C-SiC; these defects are generated either by implantation of any ion species or by an oxidation process and (c) the observation of absorption lines in infrared (IR) spectra, which are due to phosphorus donors in 6H-SiC.