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Silicon materials remain unused for supercapacitors due to extreme reactivity of silicon with electrolytes. However, doped silicon materials boast a low mass density, excellent conductivity, a controllably etched nanoporous structure, and combined earth abundance and technological presence appealing to diverse energy storage frameworks. Here, we demonstrate a universal route to transform porous silicon (P-Si) into stable electrodes for electrochemical devices through growth of an ultra-thin, conformal graphene coating on the P-Si surface. This graphene coating simultaneously passivates surface charge traps and provides an ideal electrode-electrolyte electrochemical interface. This leads to 10–40X improvement in energy density, and a 2X wider electrochemical window compared to identically-structured unpassivated P-Si. This work demonstrates a technique generalizable to mesoporous and nanoporous materials that decouples the engineering of electrode structure and electrochemical surface stability to engineer performance in electrochemical environments. Specifically, we demonstrate P-Si as a promising new platform for grid-scale and integrated electrochemical energy storage.

A simple CVD method, employing the thermally induced reactions of ammonia with decaborane, has been found to generate boron nitride nanosheets (BNNS) on polycrystalline nickel and copper foils. Most of the BNNS deposited on Ni were two- or three-layered; however, some regions were thicker, containing up to six BN layers.

One-dimensional nanostructures exhibit quantum confinement which leads to unique electronic properties, making them attractive as the active elements for nanoscale electronic devices. Boron nitride nanotubes are of particular interest since, unlike carbon nanotubes, all chiralities are semiconducting. Here, we report a synthesis based on the use of low pressures of the molecular precursor borazine in conjunction with a floating nickelocene catalyst that resulted in the formation of double-walled boron nitride nanotubes. As has been shown for carbon nanotube production, the floating catalyst chemical vapor deposition method has the potential for creating high quality boron nitride nanostructures with high production volumes.