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Low-energy electron beam lithography is a promising patterning solution for the 21 nm half-pitch node and beyond due to its high resolution, low substrate damage, and increased resist sensitivities. To ensure a successful electron-optical system (EOS) design, many factors such as focusing properties (FPs) and patterning fidelity (PF) have to be considered. In traditional EOS optimization flow, FPs are typical performance indices selected when optimizing the EOS design parameters. In each numerical iteration, the EOS FP simulation results are compared with specified performance index values. The differences are reduced by adjusting the EOS design parameters until convergence. However, the performance indices related to FPs may have no direct relation to lithography PF, which is judged by the quality of the developed resist patterns. A new EOS design methodology which directly incorporates lithography PF metrics into the optimization flow is proposed. The EOS design parameters are first optimized while meeting the geometric constraints by using the traditional design flow to obtain acceptable FPs. In order to ensure lithography PF, writing patterns are selected and writing parameters are optimized. Then, constraints and cost functions related to PF are selected to further optimize the EOS design parameters to obtain acceptable PF. In each numerical iteration, the simulated lithography patterning results are compared against specified PF metric values. Their differences are reduced by adjusting the EOS design parameters until all constraints are met and PF cost functions are converged. The proposed method is applied to an EOS structure design for a 5 keV electron beam lithography system which includes a single-gate source and a focusing lens. Initial values of EOS design parameters and geometric constraints are selected based on previous studies. A drawn layout for a 22 nm isolated line pattern is used for verifying the lithography PF specifications based on the International Technology Roadmap of Semiconductors. The developed resist pattern after applying the proposed method clearly indicates that the PF is significantly improved from the value of corresponding critical dimension (CD) and the value of gate CD control.

We study soft-gluon radiation in top quark decay within the framework of perturbative fragmentation functions. We present results for the b-quark energy distribution, accounting for soft-gluon resummation to next-to-leading logarithmic accuracy in both the MS coefficient function and in the initial condition of the perturbative fragmentation function. The results show a remarkable improvement and the b-quark energy spectrum in top quark decay exhibits very little dependence on factorization and renormalization scales. We present some hadron-level results in both x B and moment space by including non-perturbative information determined from e + e − data.

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The design, fabrication, and evaluation of a high-frequency single-element transducer are described. The transducer has an annular geometry, with the thickness of the piezoelectric material increasing from the center to the outside. This single-element annular transducer (SEAT) can provide a broader frequency range than a conventional single-element transducer with a uniform thickness (single-element uniform transducer, or SEUT). We compared the characteristics of a SEAT and a SEUT. Both transducers used 36 degrees-rotated, Y-cut lithium niobate (LiNbO(3)) material. The SEAT had a diameter of 6 mm and comprised 6 subelements of equal area (electrically connected by a single electrode on each side) whose thickness ranged from 60 microm (center) to 110 microm (outside), which resulted in the center frequency of the subelements varying from 59.8 MHz to 25 MHz. The overall center frequency was 42.4 MHz. The annular pattern was constructed using an ultrasonic sculpturing machine that reduced the root-mean-square value of the surface roughness to 454.47 nm. The bandwidth of the SEAT was 19% larger than that of the SEUT. However, compared with the SEUT, the 2-way insertion loss of the SEAT was increased by 3.1 dB. The acoustic beam pattern of the SEAT was also evaluated numerically by finite-element simulations and experimentally by an ultrasound beam analyzer. At the focus (10.5 mm from the transducer surface), the -6 dB beam width was 108 microm. There was reasonable agreement between the data from simulations and experiments. The SEAT can be used for imaging applications that require a wider transducer bandwidth, such as harmonic imaging, and can be manufactured using the same techniques used to produce transducers with multiple frequency bands.