The TFT‐alley process for high resolution and large screen size TFT‐LCD such as 20UXGA (1600×1200) is developed without the need for extra processing steps. A demonstrated novel process uses Pure‐Al metal as gate and source electrode with low dielectric interlayer, which can result in achieving high performance a‐Si TFT with high yield. 18.1SXGA(1280×1024) panel was already introduced in the mass production and achieved high cost performance with high aperture ratio.