An electron-cyclotron resonance plasma source that generates 500 mm wide plasma has been developed. The plasma is generated by a 2.45 GHz traveling microwave which is supplied through a long slot antenna prepared in the waveguide in a divergent magnetic field generated by permanent magnets and a solenoid coil. Diamondlike carbon (DLC) films were deposited in a wide zone 320 mm in width. The breakdown field was 8.4×106 V/cm and permittivity, 3.89. The prepared Al/DLC/Si metal/insulator/semiconductor diode revealed fairly good field effect in its capacitance–voltage curve.

An automatic microwave stub tuner (AST) has been developed and used to characterize and stabilize an electron-cyclotron resonance (ECR) plasma source. The tuner provides a new method for measuring plasma impedance dynamically without disturbing the plasma. The Ar ECR plasmas were excited by a 2.45 GHz microwave (<800 W) in the presence of the static axial magnetic fields ranging from 875 to 2000 G, and the characteristics were investigated using a double probe and the AST. Results of these measurements indicated that the Ar ECR plasma had discrete stable modes where the plasma parameters and impedance varied continuously. For certain operating conditions, slight shifts of microwave power and/or magnetic-field strength brought about discontinuous mode transitions. In the transition regions, the drastic changes of plasma characteristics were observed, resulting in the instability of the plasma. It was quite effective for stabilizing the unstable plasmas to control the reflection coefficient of the microwave transmission line.

Diamond thin films have been grown by an electron-cyclotron-resonance (ECR) microwave plasma chemical vapor deposition (CVD) apparatus under the addition of oxygen to the host ambient gas of a mixture of CO and H2 gas. Although the amount of oxygen was very minute (0-6% vol. fraction), significant changes due to the oxygen were brought about in the growth properties and the film crystallinity. The Raman spectroscopy revealed a dramatically improved film crystallinity and the film was dominated by the grain growth, resulting in the faceted morphology. With increase in the oxygen up to 4.55%, the visible cathodeluminescence (CL) intensity grew by more than ten times. However, the CL spectrum indicated an appearance of one or two extra recombination centers depending on the amount of oxygen.

An electron cyclotron resonance (ECR) plasma source which generates 500-mm-wide plasma has been developed. A divergent magnetic field sufficient for ECR is generated by permanent magnets and a solenoid coil. A 2.45-GHz traveling microwave is supplied through a long slot antenna prepared in the sidewall of the waveguide and excites ECR plasma. This apparatus is applied to the diamondlike carbon (DLC) films deposition and DLC films were deposited in a wide zone 320 mm in width.

An electron-cyclotron resonance (ECR) plasma source which generates a long and narrow plasma 500 mm in length has been developed. The plasma is generated by a 2.45 GHz traveling microwave which is supplied through a slot antenna prepared in the waveguide in a magnetic field generated by permanent magnets. Diamond-like carbon (DLC) films were deposited in a wide zone 340 mm in width. The variation of film thickness was less than 10%. The resistivity of the DLC film was ∼9.62×1011 Ω·cm and permittivity, 3.63. The prepared Al/DLC/Si metal/insulator/semiconductor (MIS) diode revealed fairly good field effect in its capacitance-voltage curve.