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The work examining the evolution of the rough Cu surface morphology during the electropolishing process is presented. The surface width, w, is measured for different length scale, l, and time of the electropolishing experiments, t, and the data are analyzed within the scope of the scaling concept and predictions of electropolishing theory. The experimental data indicates that surface width as a function of the length scale maintains two scaling regimes (l l C ; w ~ l C and, l l C ; w const). The roughness exponents ( ), extracted from the data obtained for different polishing times show the time dependence described by linear regression. The decrease of surface width with polishing time is well described by exponential decay predicted by the mathematical model of an ideal electropolishing process. The semi-empirical function is proposed to describe the surface width decrease during the electropolishing and the example of its practical application is discussed.

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