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Single layered molybdenum disulfide with a direct bandgap is a promising twodimensional material that goes beyond graphene for next generation nanoelectronics. Here, we report the controlled vapor phase synthesis of molybdenum disulfide atomic layers and elucidate a fundamental mechanism for the nucleation, growth, and grain boundary formation in its crystalline monolayers. Atomic layered graphene has shown many fascinating properties as a supplement to silicon-based semiconductor technologies [1][2][3][4] . Consequently, great effort has been devoted to the development and understanding of its synthetic processes [5][6][7][8] . However, graphene with its high leaking current, due to its zero bandgap energy, is not suitable for many applications in electronics and optics 9, 10 . Recent developments in two different classes of materials -transition metal oxides and sulfides -have shown many promises to fill the existing gaps [10][11][12] . For example, the successful demonstration of molybdenum disulfide (MoS 2 )-based field-effect transistors (FET) 11 , has prompted an intense exploration of the physical properties of few-layered MoS 2 films [13][14][15][16][17] .MoS 2 is a layered semiconductor with a bandgap in the range of 1.2-1.8 eV, whose physical properties are significantly thickness-dependent 13,14 . For instance, a considerable enhancement in the photoluminescence of MoS 2 has been observed as the thickness of the material decreases 14 . The lack of inversion symmetry in single-layer Initially, small triangular domains were nucleated at random locations on the bare substrate (Fig. 1a). Then, the nucleation sites continued to grow and formed boundaries when two or more domains met (Figs. 1b and 1c), resulting in a partially continuous film.This process can eventually extend into large-area single-layered MoS 2 continuous films if sufficient precursor supply and denser nucleation sites are provided (Fig. 1d) In the quest for feasible strategies to control the nucleation process, we take advantage of some of our common experimental observations. Our experiments show that the MoS 2 triangular domains and films are commonly nucleated and formed in the vicinity of the substrates' edges, scratches, dust particles, or rough surfaces (supplementary Fig. S4).We utilized this phenomenon to control the nucleation by strategically creating step edges on substrates using conventional lithography processes (Fig. 1e). The patterned substrates with uniform distribution of rectangular SiO 2 pillars (40×40 μm 2 in size, 40 μm apart, and ~40 nm thick) were directly used in the CVD process for MoS 2 growth ( The inherent dependence of this approach on the edge-based nucleation resembles some of the observations and theoretical predictions in the growth other layered materials [29][30] .Theoretical studies have revealed a significant reduction in the energy barrier of graphene nucleation close to the step edges, as compared to flat surfaces of transition metal substrates 30 . We propose that similar edge-based catalytic pr...

Graphene and hexagonal boron nitride (h-BN) have similar crystal structures with a lattice constant difference of only 2%. However, graphene is a zero-bandgap semiconductor with remarkably high carrier mobility at room temperature, whereas an atomically thin layer of h-BN is a dielectric with a wide bandgap of ∼5.9 eV. Accordingly, if precise two-dimensional domains of graphene and h-BN can be seamlessly stitched together, hybrid atomic layers with interesting electronic applications could be created. Here, we show that planar graphene/h-BN heterostructures can be formed by growing graphene in lithographically patterned h-BN atomic layers. Our approach can create periodic arrangements of domains with size ranging from tens of nanometres to millimetres. The resulting graphene/h-BN atomic layers can be peeled off the growth substrate and transferred to various platforms including flexible substrates. We also show that the technique can be used to fabricate two-dimensional devices, such as a split closed-loop resonator that works as a bandpass filter.

Atomic layers of two-dimensional (2D) materials have recently been the focus of extensive research. This follows from the footsteps of graphene, which has shown great potential for ultrathin optoelectronic devices. In this paper, we present a comprehensive study on the synthesis, characterization, and thin film photodetector application of atomic layers of InSe. Correlation between resonance Raman spectroscopy and photoconductivity measurements allows us to systematically track the evolution of the electronic band structure of 2D InSe as its thickness approaches few atomic layers. Analysis of photoconductivity spectra suggests that few-layered InSe has an indirect band gap of 1.4 eV, which is 200 meV higher than bulk InSe due to the suppressed interlayer electron orbital coupling. Temperature-dependent photocurrent measurements reveal that the suppressed interlayer interaction also results in more localized pz-like orbitals, and these orbitals couple strongly with the in-plane E' and E″ phonons. Finally, we measured a strong photoresponse of 34.7 mA/W and fast response time of 488 μs for a few layered InSe, suggesting that it is a good material for thin film optoelectronic applications.

Two dimensional (2D) materials have attracted great attention due to their unique properties and atomic thickness. Although various 2D materials have been successfully synthesized with different optical and electrical properties, a strategy for fabricating 2D heterostructures must be developed in order to construct more complicated devices for practical applications. Here we demonstrate for the first time a two-step chemical vapor deposition (CVD) method for growing transition-metal dichalcogenide (TMD) heterostructures, where MoSe2 was synthesized first and followed by an epitaxial growth of WSe2 on the edge and on the top surface of MoSe2. Compared to previously reported one-step growth methods, this two-step growth has the capability of spatial and size control of each 2D component, leading to much larger (up to 169 μm) heterostructure size, and cross-contamination can be effectively minimized. Furthermore, this two-step growth produces well-defined 2H and 3R stacking in the WSe2/MoSe2 bilayer regions and much sharper in-plane interfaces than the previously reported MoSe2/WSe2 heterojunctions obtained from one-step growth methods. The resultant heterostructures with WSe2/MoSe2 bilayer and the exposed MoSe2 monolayer display rectification characteristics of a p-n junction, as revealed by optoelectronic tests, and an internal quantum efficiency of 91% when functioning as a photodetector. A photovoltaic effect without any external gates was observed, showing incident photon to converted electron (IPCE) efficiencies of approximately 0.12%, providing application potential in electronics and energy harvesting.