Vivid colors are demonstrated in silicon nanowires with diameters ranging from 105 to 346 nm. The nanowires are vertically arranged in a square lattice with a pitch of 400 nm and are electromagnetically coupled to each other, resulting in frequency-dependent reflection spectra. Since the coupling is dependent on the refractive index of the medium surrounding the nanowires, the arrays can be used for sensing. A simple sensor is demonstrated by observing the change in the reflected color with changing refractive index of the surrounding medium. A refractive index resolution of 5 × 10(-5) is achieved by analyzing bright-field images captured with an optical microscope equipped with a charge coupled device camera.

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We report fabrication methods, including metal masks and dry etching, and demonstrate highly ordered vertical gallium arsenide nanowire arrays. The etching process created high aspect ratio, vertical nanowires with insignificant undercutting from the mask, allowing us to vary the diameter from 30 nm to 400 nm with a pitch from 250 nm to 1100 nm and length up to 2.2 μm. A diameter to pitch ratio of ∼68% was achieved. We also measured the reflectance from the nanowire arrays and show experimentally diameter-dependent strong absorption peaks resulting from resonant optical mode excitations within these nanowires. The reflectance curves match very well with simulations. The work done here paves the way towards achieving high efficiency solar cells and tunable photodetectors using III–V nanowires.

Vertical ordered silicon nanowire arrays with diameters ranging from 30 to 60 nm are fabricated and display enhanced Raman scattering. The first-order 520 cm(-1) phonon mode shows no significant shift or peak broadening with increasing laser power, suggesting that the excellent defect-free diamond crystalline structure and thermal properties of bulk silicon are maintained. The Raman enhancement per unit volume of the first-order phonon peak increases with increasing nanowire diameter, and has maximum enhancement factors of 7.1 and 70 when compared to the original silicon on insulator (SOI) and bulk silicon wafers, respectively. For the array with 60 nm diameter nanowires, the total Raman intensity is larger than that of the SOI wafer. The results are understood using a model based on the confinement of light and are supported by finite difference time domain (FDTD) simulations.