Residual absorption in optical coatings and materials is directly measured by means of the laser-induced deflection (LID) technique. For transmissive coatings a measurement strategy is introduced that allows for the separation of different absorptions of the investigated sample (bulk, coating, surface) by use of only one sample. Laser irradiation yields absorption values between 2 x 10(-3) and 2.9 x 10(-2) for antireflecting and highly reflecting (HR) coatings at 193 nm and 30.6 x 10(-6) for a HR mirror at 527 nm. Use of laser-induced fluorescence at 193 nm excitation reveals trivalent cerium and prasodymium and hydrocarbons in different single layers and coatings. In addition to correlation with absorption data, the influence of a high fluorescence quantum yield on the absorption measurement is discussed.
Using experimental results and numerical simulations, two measuring concepts of the laser induced deflection (LID) technique are introduced and optimized for absolute thin film absorption measurements from deep ultraviolet to IR wavelengths. For transparent optical coatings, a particular probe beam deflection direction allows the absorption measurement with virtually no influence of the substrate absorption, yielding improved accuracy compared to the common techniques of separating bulk and coating absorption. For high-reflection coatings, where substrate absorption contributions are negligible, a different probe beam deflection is chosen to achieve a better signal-to-noise ratio. Various experimental results for the two different measurement concepts are presented.
Absolute measurement of residual absorption in optical coatings is steadily becoming more important in thin film characterization, in particular with respect to high power laser applications. A summary is given on the current ability of the laser induced deflection (LID) technique to serve sensitive photo-thermal absorption measurements combined with reliable absolute calibration based on an electrical heater approach. To account for different measurement requirements, several concepts have been derived to accordingly adapt the original LID concept. Experimental results are presented for prominent UV and deep UV laser wavelengths, covering a variety of factors that critically can influence the absorption properties in optical coatings e.g., deposition process, defects and impurities, intense laser irradiation and surface/interface engineering. The experimental findings demonstrate that by combining high sensitivity with absolute calibration, photo-thermal absorption measurements are able to be a valuable supplement for the characterization of optical thin films and coatings.
The oxidation and passivation of freshly prepared silicon nanocrystals (Si NCs) have been studied by exciting them with a low-fluence violet laser at 406 nm and measuring both the heat generated by nonradiative transitions and the photoluminescence (PL) resulting from radiative charge carrier recombination over a period of 31 days. Laser-induced deflection was employed as a sensitive tool to determine the heat transferred to the phonon bath. The PL quantum efficiency of Si NCs passivated in air was found to develop with a time constant of 8 d from zero to a terminal saturation value of approximately 65%.
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