Pulsed laser deposition technique was used for growing thin films of ZnO on Si (100) substrate held at different temperatures (Ts). All the as-deposited films have shown a preferential c-axis orientation associated with varying grain size as a function of Ts ranging from 100to600°C. Current-voltage (I-V) characteristics of these films show Ohmic behavior over the entire Ts range studied. These films were subjected to annealing at 800°C in air ambient for 4h. The grain size was observed to increase after the annealing process for all the films deposited at different Ts. Interestingly, these annealed films show nonlinear variation of current with applied voltage, very similar to the one observed in doped ZnO varistors. The nonlinear parameters such as the asymmetric behavior of change in current on the polarity reversal of voltage, the plateau region, and the break down voltage are observed to depend on Ts. This nonlinear behavior can perhaps be explained on the basis of electronic conduction model proposed for the bulk, doped ZnO varistors. The role of insulating intergranular layers between the disoriented microcrystallites is expected to be similar to that played by insulating intergranular layers in the doped ZnO varistors.
We report the experimental observation of variable range hopping conduction in focused-ion-beam (FIB) fabricated ultra-narrow nanowires of topological insulator (Bi2Se3). The value of the exponent (d + 1)−1 in the hopping equation was extracted as for different widths of nanowires, which is the proof of the presence of Efros-Shklovskii hopping transport mechanism in a strongly disordered system. High localization lengths (0.5 nm, 20 nm) were calculated for the devices. A careful analysis of the temperature dependent fluctuations present in the magnetoresistance curves, using the standard Universal Conductance Fluctuation theory, indicates the presence of 2D topological surface states. Also, the surface state contribution to the conductance was found very close to one conductance quantum. We believe that our experimental findings shed light on the understanding of quantum transport in disordered topological insulator based nanostructures.
Articles you may be interested inElectrical characterization of zinc oxide/aluminum nitride thin film precursor field effect transistor structures: A conducting atomic force microscopy and density functional theoretical study J. Appl. Phys. 108, 094510 (2010); 10.1063/1.3471815 Solution-processed zinc-tin oxide thin-film transistors with low interfacial trap density and improved performance Appl. Phys. Lett. 96, 243501 (2010); 10.1063/1.3454241 High performance thin film transistor with cosputtered amorphous Zn-In-Sn-O channel: Combinatorial approach Appl. Phys. Lett. 95, 072104 (2009); 10.1063/1.3206948 ZnO-based thin film transistors having high refractive index silicon nitride gate A comparison of zinc oxide thin-film transistors on silicon oxide and silicon nitride gate dielectrics
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.