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Diffraction gratings are key elements of soft X-ray synchrotron beamlines. Besides wavelength dispersion, specific parameters can be tailored to adjust the energy dependent efficiency and focusing, and to correct wavefront aberrations. As key elements of a beamline, any departure from the design values can severely reduce the overall performance. On the other hand, known non-conformities can often be corrected by slight adjustment of the alignment parameters. A careful and accurate metrology is therefore required before installation on the beamline. After presenting what variable line spacing gratings, variable groove depth gratings, and alternate multilayer gratings are, the use of the SOLEIL long trace profiler for the measurement of groove density variation along the surface and of the atomic force microscope for the groove geometry and roughness characterizations will be discussed. A few examples of grating metrology will be presented and analyzed with the help of optical simulations.

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Stitching methods are increasingly used for determining the surface shape of large and high precision optical elements used in synchrotron beamlines. They consist in reconstructing the surface topography from multiple measurements on overlapping parts of the optics aperture by various algorithms. This paper is an attempt to investigate how true and accurate such a reconstruction can be. Error sources are identified and evaluated throughout the acquisition and processing steps. The analysis is based on the example SOLEIL Michelson interferometer for nano-topography, a dedicated measurement bench for stitching interferometry. We propose a method for determining the error made on the estimate of the interferometric reference surface from the stitching dataset. This determination is made before and independently of the stitching procedure itself.