Shrinking pixel size in conventional CCD imagers degrades device performance. Unsatisfactory smear noise of -90dB is attained in a Y3-inch 2M pixel CCD imager Ill. The STACK-CCD imager has a great advantage regarding this problem. A 100% aperture ratio and low smear noise are maintained regardless of future pixel shrinking, because CCD scanning circuits are overlaid with a n amorphous silicon (a-Si) photoconversion layer.

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The ratio of Si-H2 bonds to hydrogen content in hydrogenated amorphous silicon films, prepared by mercury-sensitized photochemical vapor deposition, depends on the deposition conditions, in particular on the distance between the substrate and the light-transparent window.The ratio is reduced from 20 % to 8 % by decreasing the distance from 30 mm to 8 mm. On the other hand, the hydrogen content remains constant at 15 at.%. Decreasing the distance has been found to be almost equivalent to increasing the light intensity, especially 254 nm-light intensity.

Planar optical waveguides can easily be fabricated in an undergraduate laboratory using diffusion of silver or potassium ions in a glass plate. These waveguides are cbaracterized using the black line and the m-lines techniques. A refractive index prolile of the diffused waveguides is obtained by inversion of these data using the \\XB method. The inhence of baking conditions on the diffusion depth is discussed. Lee Chin C 1994 IEEE Photonics Tech. Lett. 2 409-11 Left. 15 1206-8 1321-34 C D W and De La Rue R M 1977 IEEE . I . Qunrzttmr Electron. QC13 192-200 Tien P K, Riva-Sanseverino S, Martin R I, Ballman A A and Brown H 1974 App/. Phys. Lett. 24 503-6

An Hg sensitized photochemical vapor deposition method has been developed which has enabled the hydrogenated amorphous silicon photoconversion layer to be overlaid on a CCD imaging device, without needing the pixel separation structure. This C M method has been used to realize imaging devices with high sensitivity and high resolution for high definition TV.