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This paper discusses the use of pen pressure as a feature in writer-independent on-line handwriting recognition. We propose two kinds of features related to pen pressure: one is the pressure representing pen ups and downs in a continuous manner; the other is the time-derivative of the pressure representing the temporal pattern of the pen pressure. Combining either of them with the existing feature (velocity vector), a 3-dimensional feature is composed for character recognition. Some techniques of interpolating the pen pressure during the pen-up interval is also proposed for a pre-processing purpose. Through experimental evaluation using 1,016 elementary Kanji characters compared with the baseline performance using velocity vector only, the additional use of pen pressure improved the performance from 97.5% to 98.1% for careful writings and from 91.1% to 93.1% for cursive writings.

This paper proposes a novel handwriting recognition interface for wearable computing where users write characters continuously without pauses on a small single writing box. Since characters are written on the same writing area, they are overlaid with each other. Therefore the task is regarded as a special case of the continuous character recognition problem. In contrast to the conventional continuous character recognition problem, location information of strokes does not help very much in the proposed framework. To tackle the problem, substroke based hidden Markov models (HMMs) and a stochastic bigram language model are employed. Preliminary experiments were carried out on a dataset of 578 handwriting sequences with a character bigram consisting of 1,016 Japanese educational Kanji and 71 Hiragana characters. The proposed method demonstrated promising performance with 69.2% of handwriting sequences beeing correctly recognized when different stroke order was permitted, and the rate was improved up to 88.0% when characters were written with fixed stroke order.

It is very important to mitigate oxidation of multilayer mirrors (MLMs) and carbon deposition onto MLMs to extend the lifetime of EUV exposure tool. In order to estimate the lifetime, we have to figure out scaling law. Previous results at EUVA have shown that carbon deposition rate on MLMs is not proportional to every hydrocarbon partial pressure and every EUV intensity 3-4 . In this study we focused on carbon deposition on Si-capped multilayer mirror. We made experiments of EUV irradiation to the MLMs using two different apparatuses. One is connected to a beamline (SBL-2) of synchrotron radiation facility Super-ALIS in the NTT Atsugi research and development center, and the other is connected to a beamline (BL9) of synchrotron radiation facility New SUBARU in the University of Hyogo. As the result of experiments, we found that different carbon deposition rate occurred on the different beamlines, although they have the same average EUV intensity. We present differences of carbon deposition rate on MLMs between two different beamlines and estimation of carbon deposition rate on EUV tool analyzing dependences of carbon deposition rate on characteristics of EUV source.

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