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With the advance of scale and integrity of LSIs, several kinds of CAD systems are being developed and introduced to design verification and mask pattern generation for mask pattern data as a means of shortening the design time. The processings common to these CAD systems are pattern logical operations. This paper proposes effective and fast pattern operation algorithms for large‐scale data containing patterns of any angle: the virtual slit method and limited searching algorithm. The virtual slit method is a logical operation algorithm performing concurrently the three processings, intersection‐point calculation, slit division, and logical processing which have been done independently in old algorithms. The limited searching algorithm is a highspeed intersection‐point calculation algorithm indispensable for diagonal figures. The time complexity of both methods is theoretically O(Nv) log Nv) where Nv is the number of input vectors. For manufactured LSI mask data, we obtained the result for the time complexity based on estimation by program execution which can be approximated by O(Nv).

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